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Autori: Radovic Ivan S

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Naslov Analysis of SiO2 thin film deposited by reactive sputtering (Article)
Autori Radovic Ivan S  Serruys Yves  Limoge Yves  Jaoul O  Romcevic Nebojsa Z  Poissonnet S  Bibic Natasa M 
Info RECENT DEVELOPMENTS IN ADVANCED MATERIALS AND PROCESSES, (2006), vol. 518 br. , str. 149-154
Ispravka ISI/Web of Science   Elečas   Rang časopisa   Citati: ISI/Web of Science  
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