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Autori: Radovic Ivan S

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Naslov Stoichiometric SiO2 thin films deposited by reactive sputtering (Article)
Autori Radovic Ivan S  Serruys Yves  Limoge Yves  Bibic Natasa M  Poissonnet S  Jaoul O  Mitric Miodrag N  Romcevic Nebojsa Z  Milosavljevic Momir S 
Info MATERIALS CHEMISTRY AND PHYSICS, (2007), vol. 104 br. 1 , Suppl. , str. 172 -176
Ispravka ISI/Web of Science   Članak   Elečas   Rang časopisa   Citati: ISI/Web of Science  
Naslov Ion implantation induced structural changes in reactively sputtered Cr-N layers on Si substrates (Article)
Autori Novakovic Mirjana M  Popovic Maja C  Perusko Davor B  Milinovic Velimir R  Radovic Ivan S  Bibic Natasa M  Mitric Miodrag N  Milosavljevic Momir S 
Info NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, (2007), vol. 257 br. , str. 782-785
Ispravka ISI/Web of Science   Članak   Elečas   Rang časopisa   Citati: ISI/Web of Science   Scopus  
Naslov Ion beam assisted deposition of TiN thin films on Si substrate (Article)
Autori Milinovic Velimir R  Milosavljevic Momir S  Popovic Maja C  Novakovic Mirjana M  Perusko Davor B  Radovic Ivan S  Bibic Natasa M 
Info RECENT DEVELOPMENTS IN ADVANCED MATERIALS AND PROCESSES, (2006), vol. 518 br. , str. 155-160
Ispravka ISI/Web of Science   Elečas   Rang časopisa   Citati: ISI/Web of Science  
Naslov Analysis of SiO2 thin film deposited by reactive sputtering (Article)
Autori Radovic Ivan S  Serruys Yves  Limoge Yves  Jaoul O  Romcevic Nebojsa Z  Poissonnet S  Bibic Natasa M 
Info RECENT DEVELOPMENTS IN ADVANCED MATERIALS AND PROCESSES, (2006), vol. 518 br. , str. 149-154
Ispravka ISI/Web of Science   Elečas   Rang časopisa   Citati: ISI/Web of Science  
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