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Naslov Micro-Raman depth profiling of silicon amorphization induced by high-energy ion channeling implantation (Article)
Autori Eric Marko V  Petrovic Srdjan M  Kokkoris M  Liarokapis E  Antonakos A  Telecki Igor N 
Info JOURNAL OF RAMAN SPECTROSCOPY, (2013), vol. 44 br. 3, str. 496-500
Projekat Ministry of Education and Science of Serbia [45006]; European Commission [227012]
Ispravka ISI/Web of Science   Članak   Elečas   Rang časopisa   Citati: ISI/Web of Science   Scopus  
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