Autori: Ringwood JV
| Naslov | Real-time plasma control in a dual-frequency, confined plasma etcher (Article) |
| Autori | Milosavljevic Vladimir M Ellingboe AR Gaman C Ringwood JV |
| Info | JOURNAL OF APPLIED PHYSICS, (2008), vol. 103 br. 8, str. - |
| Ispravka | ISI/Web of Science Članak Elečas Rang časopisa Citati: ISI/Web of Science Scopus |
