Autori: Cheung WY
| Naslov | On temperature coefficient of resistance of boron-doped SiGe films deposited by sputtering (Article) |
| Autori | Jelenkovic Emil V Jevtic Milan M Tong KY Pang GKH Cheung WY Jha Shrawan K |
| Info | MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, (2007), vol. 10 br. 4-5, str. 143-149 |
| Ispravka | ISI/Web of Science Članak Elečas Rang časopisa Citati: ISI/Web of Science |
