@ARTICLE{
author={Radovic Ivan S,Serruys Yves,Limoge Yves,Bibic Natasa M},
year={2008},
title={Reactive sputtering deposition of SiO2 thin films},
journal={JOURNAL OF THE SERBIAN CHEMICAL SOCIETY},
volume={73},
number={1},
pages={121-126},
document_type={Article},
} 

@ARTICLE{
author={Radovic Ivan S,Serruys Yves,Limoge Yves,Milosavljevic Momir S,Romcevic Nebojsa Z,Bibic Natasa M},
year={2007},
title={Deposition on thin SiO2 layer by reactive sputtering},
journal={OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS},
volume={1},
number={5},
pages={247-251},
document_type={Article},
} 

@ARTICLE{
author={Radovic Ivan S,Serruys Yves,Limoge Yves,Bibic Natasa M,Poissonnet S,Jaoul O,Mitric Miodrag N,Romcevic Nebojsa Z,Milosavljevic Momir S},
year={2007},
title={Stoichiometric SiO2 thin films deposited by reactive sputtering},
journal={MATERIALS CHEMISTRY AND PHYSICS},
volume={104},
number={1},
pages={172-176},
document_type={Article},
} 

@ARTICLE{
author={Radovic Ivan S,Serruys Yves,Limoge Yves,Jaoul O,Romcevic Nebojsa Z,Poissonnet S,Bibic Natasa M},
year={2006},
title={Analysis of SiO2 thin film deposited by reactive sputtering},
journal={RECENT DEVELOPMENTS IN ADVANCED MATERIALS AND PROCESSES},
volume={518},
number={},
pages={149-154},
document_type={Article},
}